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High-quality hydrogen fluoride gas sensors employ an advanced three-electrode detection principle with a detection range of 0–10 ppm and sensitivity as high as -400±100 nA/ppm, ensuring rapid capture of gas leaks or trace HF. With a resolution of 0.1ppm, the electrochemical three-electrode structure ensures measurement stability and accuracy, featuring minimal zero drift for long-term reliable operation in harsh environments.
Hydrogen fluoride gas sensors are primarily used to detect HF concentrations in the air. Hydrogen fluoride is a highly corrosive and toxic gas commonly found in chemical production, metal etching, glass processing, and similar applications. The sensor continuously monitors for gas leaks and triggers an alarm when concentrations exceed safe levels, ensuring personnel safety and equipment operation.
Most common HF sensors utilize electrochemical detection principles. Electrode reactions generate current signals proportional to gas concentration, offering advantages like high sensitivity and fast response times, making them suitable for long-term monitoring in industrial environments.
HF sensors are widely used in semiconductor manufacturing, glass etching, fertilizer plants, refrigerant production, chemical storage facilities, and other settings requiring HF use or storage.